Principal component analysis of plasma harmonics in end-point detection of photoresist stripping

Electronics Letters

Volumn 35, Issue 16, 1999, Pages 1383-1385

  Koh, A T C ^a   Thornhill, N F ^a   Law, V J ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FLAT PANEL DISPLAYS; HARMONIC ANALYSIS; PHOTORESISTS; PLASMA ETCHING; PROBES; SILICON WAFERS;

PHOTORESIST STRIPPING; PLASMA HARMONICS; PRINCIPAL COMPONENT ANALYSIS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032660154     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19990930     Document Type: Article

References (4)

1. BATTY, i., COOKE, M., and LAW, v.J.: 'Harmonic characterisation of a plasmatool using a diplexer, Vacuum, 1999, 52, (4), pp. 509-514
2. BUSHMAN, s., EDGAR, T.F., and TRACHTENBERG, l.: 'Modeling of plasma etch systems using ordinary least squares, recurrent neural network and projection to latent structure models', J. Eleclrochem. Soc., 1997, 144, (4), pp. 1379-1389
3. WISE, B.M., and GALLAGHER, N.B.: The process chemometrics approach to process monitoring and fault detection', J. Proc. Control, 1996, 6, (6), pp. 329-348
4. BUSHMAN, s., EDGAR, T.F., and TRACHTENBERG, i.: 'Radio frequency diagnosis for plasma etch systems', J. Electrochem. Soc., 1997, 144, (2), pp. 721-732