Effect of thermal annealing on reactive radio-frequency magnetron-sputtered carbon nitride films

Journal of Physics D: Applied Physics

Volumn 32, Issue 3, 1999, Pages 195-199

  Ghen, G L ^a   Li, Y ^a   Lin, J ^a   Huan, C H A ^a   Guo, Y P ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN COMPOUNDS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; HEAT TREATMENT; MAGNETRON SPUTTERING; SUBSTRATES;

CARBON NITRIDE FILMS; ELECTRON FIELD EMISSION;

MAGNETRON SPUTTERING; ANNEALING;

EID: 0033531295     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/3/003     Document Type: Article

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