Influence of deposition temperatures on bonding state and microstructure of carbon nitride thin films prepared by ion-beam-assisted deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 A, 1997, Pages 2313-2318

  Kohzaki, Masao ^a,b   Matsumuro, Akihito ^a   Hayashi, Toshiyuki ^a   Muramatsu, Mutsuo ^a   Yamaguchi, Katsumi ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Rd Management Section   (Japan)

Author keywords

Bonding states; Carbon nitride; Ion beam assisted deposition; IR spectroscopy; Microstructure; Nanoindentation; Raman spectroscopy; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

CARBON NITRIDE; CHEMICAL BONDING STATES; ION BEAM ASSISTED DEPOSITION;

CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; DEPOSITION; FILM GROWTH; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; NITRIDES; RAMAN SPECTROSCOPY; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS FILMS;

EID: 0031124590     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2313     Document Type: Article

References (26)

1. A. Y. Liu and M. L. Cohen: Science 245 (1989) 841.
2. A. Y. Liu and M. L. Cohen: Phys. Rev. B 41 (1990) 41.
3. K. Ogata, J. F. D. Chubachi and F. Fujimoto: J. Appl. Phys. 76 (1994) 3791.
4. F. Rossi, B. Andre, A. van Veen, P. E. Mijnarends, H. Schut, F. Labohm, H. Dunlop, M. P. Delplancke and K. Hubbard: J. Mater. Res. 9 (1994) 2440.
5. Z.-M. Ren, Y.-C. Du, Y. Qiu, J.-D. Wu, Z.-F. Ying, X.-X. Xiong and F.-M. Li: Phys. Rev. B 51 (1995) 51.
6. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahiro and S. Yamaguchi: Jpn. J. Appl. Phys. 32 (1993) L1465.
7. M. Y. Chen, D. Li, X. Lin, V. P. Dravid, Y.-W. Chung, M.-S. Wong and W. D. Sproul: J. Vac. Sci. Technol. A 11 (1993) 521.
8. M. G. Krishan, K. R. Gunasekhar and S. Mohan: J. Mater. Res. 10 (1995) 1083.
9. Y. Taki, T. Kitagawa and O. Takai: Proc. Symp. Plasma Sci Mater. 8 (1995) 39.
10. C. Niu, Y. Z. Lu and C. M. Lieber: Science 261 (1993) 334.
11. X.-A. Zhao, C. W. Ong, Y. C. Tsang, Y. W. Wong, P. W. Chan and C. L. Choy: Appl. Phys. Lett. 66 (1995) 2652.
12. T. Inoue, S. Ohshio, H. Saitoh and K. Kamata: Appl. Phys. Lett. 67 (1995) 353.
13. T.-W. Yen and C.-P. Chou: Appl. Phys. Lett. 67 (1995) 2801.
14. Y. Zhang, Z. Zhou and H. Li: Appl. Phys. Lett. 68 (1996) 634.
15. K. M. Yu, M. L. Cohen, E. E. Haller, W. L. Hansen, A. Y. Liu and I. C. Wu: Phys. Rev. B 49 (1994) 5034.
16. H. Sjöström, I. Ivanov, M. Johansson, L. Hultman, J.-E. Sundgren, S. V. Hainsworth, T. F. Page and L. R. Wallenberg: Thin Solid Films 246 (1994) 103.
17. R. M. Silverstein, G. C. Bassler and T. C. Morrill: Spectrametric Identification of Organic Compound (John Wiley and Sons, Chichester, 1981) 4th ed.
18. G. Beamson and D. Briggs: High Resolution XPS of Organic Polymers - The Scienta ESCA300 Database (John Wiley and Sons, Chichester, 1992).
19. E. T. Kang, K. G. Neoh and K. L. Tan: Mol. Phys. 70 (1990) 1057.
20. S. K. Hark, M. A. Machonkin, F. Lansen, M. L. Slade and B. A. Weinstein: AIP Conf. Proc. 120 (1984) 465.
21. F. Tuinsta and J. L. Koenig: J. Chem. Phys. 53 (1970) 1126.
22. P. Lespade, R. Al-Jishi and M. S. Dresselhaus: Carbon 20 (1987) 427.
23. R. O. Dillon, J. A. Woolam and V. Katkanant: Phys. Rev. B 29 (1984) 3482.
24. D. J. Rester, K. S. Ailey, R. F. Davis and K. L. More: J. Mater. Res. 8 (1993) 1213.
25. D. L. Medlin, T. A. Friedmann, P. B. Mirkarimi, P. Rez, M. J. Mills and K. F. McCarty: J. Appl. Phys. 76 (1994) 295.
26. M. F. Doerner and W. D. Nix: J. Mater. Res. 1 (1986) 601.