Inductively coupled plasma etching of Ta2O5

Journal of the Electrochemical Society

Volumn 146, Issue 10, 1999, Pages 3794-3798

  Lee, Kyu Pil ^a,b   Jung, K B ^a   Singh, R K ^a   Pearton, S J ^a   Hobbs, C ^a   Tobin, P ^a  

^a UNIVERSITY OF FLORIDA   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; HYDROGEN; METHANE; PLASMA ETCHING; TANTALUM COMPOUNDS; THIN FILMS;

INDUCTIVELY COUPLED PLASMA ETCHING; TANTALUM PENTOXIDE;

DIELECTRIC FILMS;

EID: 0033327743     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392552     Document Type: Article

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