Experimental and theoretical study of step coverage in metal-organic chemical vapor deposition of tantalum oxide thin films

Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 324-329

  Yun, Jong Ho ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Activation energy; Carrier gas; Metal organic chemical vapor deposition; Step coverage; Sticking coefficient; Tantalum oxide

Indexed keywords

ACTIVATION ENERGY; ARGON; DIFFUSION; HELIUM; LOW TEMPERATURE OPERATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; SUBSTRATES; THIN FILMS;

CARRIER GAS; KNUDSEN DIFFUSION RATE; STEP COVERAGE; STICKING COEFFICIENT; TANTALUM OXIDE;

TANTALUM COMPOUNDS;

EID: 0031553457     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09078-5     Document Type: Article

References (17)

1. W.R. Hitchens, W.C. Krusell and D.M. Dobkin, J. Electrochem. Soc., 140 (1993) 2615.
2. H. Sunami, T. Kure, N. Hashimoto, K. Itoh, T. Toyabe and S. Asai, IEEE Trans. Electron. Dev., ED-31 (1984) 746.
3. K. Watanabe and H. Komiyama, J. Electrochem. Soc., 137 (1990) 1222.
4. H.-S. Choi and S.-W. Rhee, J. Electrochem. Soc., 141 (1994) 475.
5. Z.-H. Zhou, E.S. Aydil, R.A. Gottscho, Y.J. Chabal and R. Reif, J. Electrochem. Soc., 140 (1993) 3316.
6. K. Tachibana, T. Shirafuji, Y. Hayashi, S. Maekawa and T. Morita, Jpn. J. Appl. Phys., 33 (1994) 4191.
7. Y. Egashira, Y. Shimogaki, H. Komiyama, Y. Akiyama, T. Sato, N. Imaishi, Y. Sato, I. Matui and T. Ohmine, Proc. 12th Int. Symp. on Chemical Vapor Deposition, The Electrochemical Society, Pennington, NJ, 1993, p. 96.
8. J.C. Rey, L.-Y. Cheng, J.P. McVittie and K.C. Saraswat, J. Vac. Sci. Technol, A9 (1991) 1083.
9. J.-H. Yun and S.-K. Park, Jpn. J. Appl. Phys., 34 (1995) 3216.
10. M. Ikegawa and J. Kobayashi, J. Electrochem. Soc., 136 (1989) 2982.
11. H.C. Wulu, K.C. Saraswat and J.P. McVittie, J. Electrochem. Soc., 138 (1991) 1831.
12. M.M. IslamRaja, C. Chang, J.P. McVittie, M.A. Cappelli and K.C. Saraswat, J. Vac. Sci. Technol., B11 (1993) 720.
13. V.K. Singh, E.S.G. Shaqfeh and J.P. McVittie, J. Vac. Sci. Technol., B10 (1992) 1091.
14. V.K. Singh, E.S.G. Shaqfeh and J.P. McVittie, J. Vac. Sci. Technol., B12 (1994) 2952.
15. A. Hasper, J. Holleman, J. Middelhoek, C.R. Kleijn and C.J. Hoogendoorn, J. Electrochem. Soc., 138 (1991) 1728.
16. J.P. McVittie, J.C. Rey, L. Y. Cheng, M.M. IslamRaja and K.C. Saraswat, International Electron Devices Meeting (IEDM) (1990) 917.
17. R.B. Bird, W.E. Stewart and E.N. Lightfoot, Transport Phenomena, Wiley, Singapore, 1960.