Properties of DC magnetron sputtered Nb and NbN films for different source conditions

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 2, 1999, Pages 1720-1723

  Losad, N N ^a,b,c   Klapwijk, T M ^a,b,c   Roddatis, V V ^a,b,c   Kov'ev, E K ^a,b,c  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

^c RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; MAGNETRON SPUTTERING; NIOBIUM; NIOBIUM COMPOUNDS; NITROGEN; PRESSURE EFFECTS; SILICON WAFERS; SPUTTER DEPOSITION;

DC MAGNETRON SPUTTERING; DEPOSITION RATE; MAGNETIC TRAP; REACTIVE SPUTTERING;

SUPERCONDUCTING FILMS;

EID: 0032646283     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.784785     Document Type: Article

References (16)

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