Bias-Sputtered Nb for Reliable Wirings in Josephson Circuits

IEEE Transactions on Magnetics

Volumn 27, Issue 2, 1991, Pages 3176-3179

  Imamura, T ^a   Ohara, S ^a   Hasuo, S ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SPUTTERING; SUPERCONDUCTING FILMS;

BIAS SPUTTERING; JOSEPHSON CIRCUITS;

SUPERCONDUCTING DEVICES;

EID: 0026120918     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.133886     Document Type: Article

References (6)

1. S. Hasuo and T. Imamura, “Digital Logic Circuits,” Proc. IEEE, 77, 1177–1193, 1989.
2. Y. Wada, “Josephson Memory Technology,” Proc. IEEE, 77, 1194–1208, 1989.
3. M. Gurvitch, M. A. Washington, and H. A. Huggins, “High Quality Refractory Josephson Tunnel Junctions Utilizing Thin Aluminum Layers,” Appl. Phys. Lett., 42, 472–474, 1983.
4. T. Imamura and S. Hasuo, “A Submicrometer Nb/A10x/Nb Josephson Junction,” J. Appl. Phys., 64, 1586–1588, 1988.
5. C. Y. Ting, V. J. Vivalda, and H. G. Schaefer, “Study of Planarized Sputtered-deposited SiO 2,” J. Vac. Sci. Technol., 15, 1105–1112, 1978.
6. T. Imamura and S. Hasuo, “Effects of Intrinsic Stress on Submicrometer Nb/A10x/Nb Josephson Junctions,” IEEE Trans. Magn., 25, 1119–1122, 1989.