-
1
-
-
36749108668
-
High quality refractory Josephson tunnel junctions utilizing thin aluminum layers
-
M. Gurvitch, W. A. Washington, and H. A. Huggins, “High quality refractory Josephson tunnel junctions utilizing thin aluminum layers,” Appl. Phys. Lett., vol. 42, pp. 472–474, 1983.
-
(1983)
Appl. Phys. Lett
, vol.42
, pp. 472-474
-
-
Gurvitch, M.1
Washington, W.A.2
Huggins, H.A.3
-
2
-
-
0005145324
-
High-quality Nb/Al-AlOx/Nb Josephson junction
-
S. Morohashi, F. Shinoki, A. Shoji, A. Aoyagi, and H. Hayakawa, “High-quality Nb/Al-AlOx/Nb Josephson junction,” Appl. Phys. Lett., vol. 46, pp. 1179–1181, 1985.
-
(1985)
Appl. Phys. Lett
, vol.46
, pp. 1179-1181
-
-
Morohashi, S.1
Shinoki, F.2
Shoji, A.3
Aoyagi, A.4
Hayakawa, H.5
-
3
-
-
0004837419
-
Experienced investigations and analysis for high-quality Nb/Al-AlOx/Nb Josephson junctions
-
S. Morohashi, S. Hasuo, and T. Yamaoka, “Experienced investigations and analysis for high-quality Nb/Al-AlOx/Nb Josephson junctions,” J. Appl. Phys., vol. 61, pp. 4835–4849, 1987.
-
(1987)
J. Appl. Phys
, vol.61
, pp. 4835-4849
-
-
Morohashi, S.1
Hasuo, S.2
Yamaoka, T.3
-
4
-
-
0000511869
-
Selective niobium anodization process for fabricating Josephson tunnel junctions
-
H. Kroger, L. N. Smith, and D. W. Jillie, “Selective niobium anodization process for fabricating Josephson tunnel junctions,” Appl. Phys. Lett., vol. 39, pp. 280–282, 1981.
-
(1981)
Appl. Phys. Lett
, vol.39
, pp. 280-282
-
-
Kroger, H.1
Smith, L.N.2
Jillie, D.W.3
-
5
-
-
0346580416
-
Hydrogenated amorphous silicon barriers for niobium-niobium Josephson junctions
-
H. Kroger, L. N. Smith, D. W. Jillie, J. B. Thaxter, R. Aucoin, L. W. Currier, C. N. Potter, D. W. Shaw, and P. H. Willis, “Hydrogenated amorphous silicon barriers for niobium-niobium Josephson junctions,” IEEE Trans. Magn., vol. MAG-21, pp. 870–873, 1985.
-
(1985)
IEEE Trans. Magn
, vol.MAG-21
, pp. 870-873
-
-
Kroger, H.1
Smith, L.N.2
Jillie, D.W.3
Thaxter, J.B.4
Aucoin, R.5
Currier, L.W.6
Potter, C.N.7
Shaw, D.W.8
Willis, P.H.9
-
6
-
-
84947666223
-
All-Nb Josephson junction using artificial barriers
-
K. Hara, ed. Englewood Cliffs, N.J.: Prentice Hall
-
O. Michikami, K. Tanabe, H. Asano, and Y. Katoh, “All-Nb Josephson junction using artificial barriers,” in Superconductivity Electronics, K. Hara, ed. Englewood Cliffs, N.J.: Prentice Hall, 1987, pp. 186–189.
-
(1987)
Superconductivity Electronics
, pp. 186-189
-
-
Michikami, O.1
Tanabe, K.2
Asano, H.3
Katoh, Y.4
-
7
-
-
36549104303
-
All refractory Nb/Yb-YbOx/Nb Josephson junction
-
S. Morohashi and S. Hasuo, “All refractory Nb/Yb-YbOx/Nb Josephson junction,” J. Appl. Phys., vol. 60, pp. 3774–3775, 1986.
-
(1986)
J. Appl. Phys
, vol.60
, pp. 3774-3775
-
-
Morohashi, S.1
Hasuo, S.2
-
9
-
-
0039191994
-
New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodes
-
A. Shoji, F. Shinoki, S. Kosaka, M. Aoyagi, and H. Hayakawa, “New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodes,” Appl. Phys. Lett., vol. 41, pp. 1097–1099, 1982.
-
(1982)
Appl. Phys. Lett
, vol.41
, pp. 1097-1099
-
-
Shoji, A.1
Shinoki, F.2
Kosaka, S.3
Aoyagi, M.4
Hayakawa, H.5
-
10
-
-
0021698080
-
All niobium nitride Josephson junction with hydrogenated amorphous silicon barrier and its application to the logic circuit
-
M. Aoyagi, A. Shoji, S. Kosaka, F. Shinoki, H. Nakagawa, S. Takada, and H. Hayakawa, “All niobium nitride Josephson junction with hydrogenated amorphous silicon barrier and its application to the logic circuit,” Japan. J. Appl. Phys., vol. 23, pp. L916-L918, 1984.
-
(1984)
Japan. J. Appl. Phys
, vol.23
, pp. L916-L918
-
-
Aoyagi, M.1
Shoji, A.2
Kosaka, S.3
Shinoki, F.4
Nakagawa, H.5
Takada, S.6
Hayakawa, H.7
-
11
-
-
0021387506
-
Josephson tunnel junctions with chemically vapor deposited polycrystalline germanium barriers
-
H. Kroger, D. W. Jillie, L. N. Smith, L. E. Phaneuf, C. N. Potter, D. M. Shaw, E. J. Cukauskas, and M. Nisenoff, “Josephson tunnel junctions with chemically vapor deposited polycrystalline germanium barriers,” Appl. Phys. Lett., vol. 44, pp. 562–564, 1984.
-
(1984)
Appl. Phys. Lett
, vol.44
, pp. 562-564
-
-
Kroger, H.1
Jillie, D.W.2
Smith, L.N.3
Phaneuf, L.E.4
Potter, C.N.5
Shaw, D.M.6
Cukauskas, E.J.7
Nisenoff, M.8
-
12
-
-
0001084394
-
Niobium nitride Josephson tunnel junctions with magnesium oxide barriers
-
A. Shoji, M. Aoyagi, S. Kosaka, F. Shinoki, and H. Hayakawa, “Niobium nitride Josephson tunnel junctions with magnesium oxide barriers,” Appl. Phys. Lett., vol. 46, p. 1098–1100, 1985.
-
(1985)
Appl. Phys. Lett
, vol.46
, pp. 1098-1100
-
-
Shoji, A.1
Aoyagi, M.2
Kosaka, S.3
Shinoki, F.4
Hayakawa, H.5
-
13
-
-
0022082299
-
5.6 ps gate delay all refractory Josephson OR gate with modified variable threshold logic
-
S. Kotani, N. Fujimaki, T. Imamura, S. Hasuo, and T. Yamaoka, “5.6 ps gate delay all refractory Josephson OR gate with modified variable threshold logic,” Japan. J. Appl. Phys., vol. 24, pp. L421-L422, 1985.
-
(1985)
Japan. J. Appl. Phys
, vol.24
, pp. L421-L422
-
-
Kotani, S.1
Fujimaki, N.2
Imamura, T.3
Hasuo, S.4
Yamaoka, T.5
-
14
-
-
0024719475
-
Digital logic circuits
-
S. Hasuo and T. Imamura, “Digital logic circuits,” Proc. IEEE, vol. 77, pp. 1177–1193, 1989.
-
(1989)
Proc. IEEE
, vol.77
, pp. 1177-1193
-
-
Hasuo, S.1
Imamura, T.2
-
15
-
-
0024719367
-
Josephson memory technology
-
Y. Wada, “Josephson memory technology,” Proc. IEEE, vol. 77, pp. 1194–1208, 1989.
-
(1989)
Proc. IEEE
, vol.77
, pp. 1194-1208
-
-
Wada, Y.1
-
16
-
-
0025557346
-
An 8-b Josephson digital signal processor
-
S. Kotani, A. Inoue, T. Imamura, and S. Hasuo, “An 8-b Josephson digital signal processor,” IEEE J. Solid-State Circuits, vol. 25, pp. 1518–1525, 1990.
-
(1990)
IEEE J. Solid-State Circuits
, vol.25
, pp. 1518-1525
-
-
Kotani, S.1
Inoue, A.2
Imamura, T.3
Hasuo, S.4
-
17
-
-
77953588322
-
A sub-ns-clock cryogenic system for Josephson computers
-
San Francisco
-
S. Kotani, A. Inoue, H. Suzuki, S. Hasuo, T. Takenouchi, K. Fukase, F. Miyagawa, S. Yoshida, T. Sano, and Y. Kamioka, “A sub-ns-clock cryogenic system for Josephson computers,” in Dig. Tech. Papers, Int. Solid-State Circuits Conf., San Francisco, 1991, p. 32.
-
(1991)
Dig. Tech. Papers, Int. Solid-State Circuits Conf
, pp. 32
-
-
Kotani, S.1
Inoue, A.2
Suzuki, H.3
Hasuo, S.4
Takenouchi, T.5
Fukase, K.6
Miyagawa, F.7
Yoshida, S.8
Sano, T.9
Kamioka, Y.10
-
18
-
-
0000299955
-
Modification of tunneling barriers on Nb by a few monolayers of Al
-
J. M. Rowell, M. Gurvitch, and J. Geerk, “Modification of tunneling barriers on Nb by a few monolayers of Al,” Phys. Rev. B, vol. 24, pp. 2278–2281, 1981.
-
(1981)
Phys. Rev. B
, vol.24
, pp. 2278-2281
-
-
Rowell, J.M.1
Gurvitch, M.2
Geerk, J.3
-
19
-
-
0001550570
-
X-ray photoemission spectroscopy study of surface oxidation of Nb/Al overlayer structures
-
J. Kwo, K. Wertheim, M. Gurvitch, and D. N. Buchanan, “X-ray photoemission spectroscopy study of surface oxidation of Nb/Al overlayer structures,” Appl. Phys. Lett., vol. 40, pp. 675–677, 1982.
-
(1982)
Appl. Phys. Lett
, vol.40
, pp. 675-677
-
-
Kwo, J.1
Wertheim, K.2
Gurvitch, M.3
Buchanan, D.N.4
-
21
-
-
0010443339
-
Preparation and characteristics of Nb/Al-oxide-Nb tunnel junctions
-
H. A. Huggins and M. Gurvitch, “Preparation and characteristics of Nb/Al-oxide-Nb tunnel junctions,” J. Appl. Phys., vol. 57, pp. 2103–2109, 1985.
-
(1985)
J. Appl. Phys
, vol.57
, pp. 2103-2109
-
-
Huggins, H.A.1
Gurvitch, M.2
-
22
-
-
0041777108
-
A submicrometer Nb/AlOx/Nb Josephson junction
-
T. Imamura and S. Hasuo, “A submicrometer Nb/AlOx/Nb Josephson junction,” J. Appl. Phys., vol. 64, pp. 1586–1588, 1988.
-
(1988)
J. Appl. Phys
, vol.64
, pp. 1586-1588
-
-
Imamura, T.1
Hasuo, S.2
-
23
-
-
84939376616
-
Fabrication technology for Josephson integrated circuits with Nb/AlOx/Nb junctions
-
K. Hara, ed. Englewood Cliffs, NJ: Prentice Hall
-
T. Imamura, H. Hoko, S. Ohara, S. Kotani, and S. Hasuo, “Fabrication technology for Josephson integrated circuits with Nb/AlOx/Nb junctions,” in Superconductivity Electronics, K. Hara, ed. Englewood Cliffs, NJ: Prentice Hall, 1987, p. 22.
-
(1987)
Superconductivity Electronics
, pp. 22
-
-
Imamura, T.1
Hoko, H.2
Ohara, S.3
Kotani, S.4
Hasuo, S.5
-
24
-
-
0024683160
-
Characterization of 8K-bit niobium Josephson memory cell array for LSI application
-
H. Hoko and T. Imamura, “Characterization of 8K-bit niobium Josephson memory cell array for LSI application,” Fujitsu Sci, Tech. J., vol. 25, no. 2, pp. 135–145, 1989.
-
(1989)
Fujitsu Sci, Tech. J
, vol.25
, Issue.2
, pp. 135-145
-
-
Hoko, H.1
Imamura, T.2
-
25
-
-
0026116757
-
Josephson integrated circuits I. Fabrication technology
-
T. Imamura, “Josephson integrated circuits I. Fabrication technology,” Fujitsu Sci. Tech. J., vol. 27, pp. 1–27, 1991.
-
(1991)
Fujitsu Sci. Tech. J
, vol.27
, pp. 1-27
-
-
Imamura, T.1
-
26
-
-
0021586724
-
Tunneling and surface properties of oxidized metal overlayers on Nb
-
A. F. Clark and R. P. Reed, eds. New York: Plenum
-
M. Gurvitch and J. Kwo, “Tunneling and surface properties of oxidized metal overlayers on Nb,” in Advances in Cryogenic Engineering, A. F. Clark and R. P. Reed, eds. New York: Plenum, 1984, pp. 509-523
-
(1984)
Advances in Cryogenic Engineering
, pp. 509-523
-
-
Gurvitch, M.1
Kwo, J.2
-
27
-
-
36549100800
-
Auger electron spectroscopy, transmission electron microscopy and scanning electron microscopy studies of Nb/Al/Nb Josephson junction structures
-
C. C. Chang, M. Gurvitch, D. M. Hwang, and C. W. Blonder, “Auger electron spectroscopy, transmission electron microscopy and scanning electron microscopy studies of Nb/Al/Nb Josephson junction structures,” J. Appl. Phys., vol. 61, pp. 5089–5097, 1987.
-
(1987)
J. Appl. Phys
, vol.61
, pp. 5089-5097
-
-
Chang, C.C.1
Gurvitch, M.2
Hwang, D.M.3
Blonder, C.W.4
-
28
-
-
0024144015
-
Thermal stability of Nb/AlOx/Nb Josephson junctions
-
A. F. Clark and R. P. Reed, eds. New York: Plenum Press
-
M. Hidaka, H. Tsuge, and Y. Wada, “Thermal stability of Nb/AlOx/Nb Josephson junctions,” in Advances in Cryogenic En-gineering, A. F. Clark and R. P. Reed, eds. New York: Plenum Press, 1988, vol. 34, pp. 765–772.
-
(1988)
Advances in Cryogenic En-gineering
, vol.34
, pp. 765-772
-
-
Hidaka, M.1
Tsuge, H.2
Wada, Y.3
-
29
-
-
0005195226
-
Cross-sectional transmission electron microscopy observation of Nb/AlOx-Al/Nb Josephson junctions
-
T. Imamura and S. Hasuo, “Cross-sectional transmission electron microscopy observation of Nb/AlOx-Al/Nb Josephson junctions,” Appl. Phys. Lett., vol. 58, pp. 645–647, 1991.
-
(1991)
Appl. Phys. Lett
, vol.58
, pp. 645-647
-
-
Imamura, T.1
Hasuo, S.2
-
30
-
-
0004836860
-
Characterization of Nb/AlOx-AI/Nb Josephson junctions by anodization profiles
-
T. Imamura and S. Hasuo, “Characterization of Nb/AlOx-AI/Nb Josephson junctions by anodization profiles,” J. Appl. Phys., vol. 66, no. 5, pp. 2173–2180, 1989.
-
(1989)
J. Appl. Phys
, vol.66
, Issue.5
, pp. 2173-2180
-
-
Imamura, T.1
Hasuo, S.2
-
31
-
-
0018807512
-
Intrinsic stress of magnetron-sputtered niobium films
-
C. T. Wu, “Intrinsic stress of magnetron-sputtered niobium films,” Thin Solid Films, vol. 64, pp. 103–110, 1979.
-
(1979)
Thin Solid Films
, vol.64
, pp. 103-110
-
-
Wu, C.T.1
-
32
-
-
0024629631
-
Effect of intrinsic stress on submicrometer Nb/AlOx/Nb Josephson junctions
-
T. Imamura and S. Hasuo, “Effect of intrinsic stress on submicrometer Nb/AlOx/Nb Josephson junctions,” IEEE Trans. Magn., vol. 25, pp. 1119–1122, 1989.
-
(1989)
IEEE Trans. Magn
, vol.25
, pp. 1119-1122
-
-
Imamura, T.1
Hasuo, S.2
-
33
-
-
0026118961
-
Cross-sectional TEM observation of Nb/AlOx-Al/Nb junctions structures
-
T. Imamura and S. Hasuo, ‘‘Cross-sectional TEM observation of Nb/AlOx-Al/Nb junctions structures,” IEEE Trans. Magn., vol. 27, pp. 3172–3175, 1991.
-
(1991)
IEEE Trans. Magn
, vol.27
, pp. 3172-3175
-
-
Imamura, T.1
Hasuo, S.2
-
34
-
-
36549104401
-
Strain in evaporated Nb thin films
-
M. Murakami and T. Yogi, “Strain in evaporated Nb thin films,” J. Appl. Phys., vol. 57, pp. 211–215, 1985.
-
(1985)
J. Appl. Phys
, vol.57
, pp. 211-215
-
-
Murakami, M.1
Yogi, T.2
-
35
-
-
84941870768
-
Characteristics of sputtered Nb films for Josephson junctions
-
Glasgow
-
T. Imamura, T. Shiota and S. Hasuo, “Characteristics of sputtered Nb films for Josephson junctions,” in Extended Abstract Int. Superconductive Electronics Conf., Glasgow, 1991, p. 29.
-
(1991)
Extended Abstract Int. Superconductive Electronics Conf
, pp. 29
-
-
Imamura, T.1
Shiota, T.2
Hasuo, S.3
-
36
-
-
36549104956
-
Niobium-stress influence on Nb/Al-oxide/Nb Josephson junctions
-
K. Kuroda and M. Yuda, “Niobium-stress influence on Nb/Al-oxide/Nb Josephson junctions,” J. Appl. Phys., vol. 63, pp. 2352–2357, 1988.
-
(1988)
J. Appl. Phys
, vol.63
, pp. 2352-2357
-
-
Kuroda, K.1
Yuda, M.2
-
37
-
-
0023347606
-
On the oxidation and on the superconductivity of niobium
-
J. Halbritter, “On the oxidation and on the superconductivity of niobium,” Appl. Phys., vol. A43, pp. 1–28, 1987.
-
(1987)
Appl. Phys
, vol.A43
, pp. 1-28
-
-
Halbritter, J.1
-
38
-
-
84947662466
-
Characterization of Nb/AlOx-Al/Nb junction structures by anodization profiles III. Surface coverage of Al deposited on Nb
-
T. Imamura, M. Shigeno, and S. Hasuo, “Characterization of Nb/AlOx-Al/Nb junction structures by anodization profiles III. Surface coverage of Al deposited on Nb,” IEICE Tech. Rep., SCE89-34, (in Japanese) 1989.
-
(1989)
IEICE Tech. Rep
, vol.SCE89-34
-
-
Imamura, T.1
Shigeno, M.2
Hasuo, S.3
-
39
-
-
0021393312
-
Critical current uniformity and stability of Nb/Al-oxide-Nb Josephson junctions
-
J. V. Gates, M. A. Washington, and M. Gurvitch, “Critical current uniformity and stability of Nb/Al-oxide-Nb Josephson junctions,” J. Appl. Phys., vol. 55, pp. 1419–1421, 1984.
-
(1984)
J. Appl. Phys
, vol.55
, pp. 1419-1421
-
-
Gates, J.V.1
Washington, M.A.2
Gurvitch, M.3
-
40
-
-
36449000156
-
Annealing stability in superconducting Nb wiring with nitrogen plasma treatment
-
T. Shiota, T. Imamura, and S. Hasuo, “Annealing stability in superconducting Nb wiring with nitrogen plasma treatment,” J. Appl. Phys., vol. 58, pp. 750–752, 1991.
-
(1991)
J. Appl. Phys
, vol.58
, pp. 750-752
-
-
Shiota, T.1
Imamura, T.2
Hasuo, S.3
-
41
-
-
84947661865
-
Annealing stability in superconducting Nb wirings with plasma nitridation
-
Glasgow
-
T. Shiota, T. Imamura, and S. Hasuo, “Annealing stability in superconducting Nb wirings with plasma nitridation,” in Extended Abstract Int. Superconductive Electronics Conf., Glasgow, 1991, p. 212.
-
(1991)
Extended Abstract Int. Superconductive Electronics Conf
, pp. 212
-
-
Shiota, T.1
Imamura, T.2
Hasuo, S.3
|