Stress in nbcxn1-x; films prepared by reactive rf magnetron sputtering

Japanese Journal of Applied Physics

Volumn 32, Issue 6 B, 1993, Pages L834-L836

  Kiryu, Shogo ^a   Shoji, Akira ^a   Kohjiro, Satoshi ^a   Kodaira, Shinji ^b  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b KISARAZU NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Rf magnetron sputtering; Stress NbCxN1 x x films; Surface morphology; X ray diffraction

Indexed keywords

CARBON INORGANIC COMPOUNDS; FILM PREPARATION; MAGNETRONS; MORPHOLOGY; NIOBIUM COMPOUNDS; NITRIDES; SPUTTER DEPOSITION; STRESSES; SURFACE PROPERTIES;

NIOBIUM CARBONITRIDE FILMS; REACTIVE RF MAGNETRON SPUTTERING; SUPERCONDUCTING NIOBIUM CARBONITRIDE; SURFACE MORPHOLOGY;

SUPERCONDUCTING FILMS;

EID: 0027612247     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.L834     Document Type: Article

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