Stress and Source Conditions of DC Magnetron Sputtered Nb Films

IEEE Transactions on Applied Superconductivity

Volumn 5, Issue 2, 1995, Pages 2326-2329

  Amos, R S ^a   Breyer, P E ^a   Huang, H H ^a   Lichtenberger, A W ^a  

^a UNIVERSITY OF VIRGINIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DEPOSITION; ELECTRIC CURRENTS; EROSION; LATTICE CONSTANTS; MAGNETRON SPUTTERING; NIOBIUM; STRESSES; SUBSTRATES; THERMAL EFFECTS;

CURRENT PRESSURE STRESS LINE; STRESS FREE FILMS; SUBSTRATE MOTION; TARGET EROSION; TARGET REPEATABILITY;

SUPERCONDUCTING FILMS;

EID: 0029324465     PISSN: 10518223     EISSN: 15582515     Source Type: Journal    
DOI: 10.1109/77.403051     Document Type: Article

References (15)

1. H. P. Murbach and H. Wilman, Proc. Phys. Soc. B, vol. 66, p. 905, 1953.
2. R. W. Hoffman, F. J. Anders, and E. C. Crittenden, Jr., J. Appl. Phys., vol. 24, p. 231, 1953.
3. E. C. Crittenden Jr. and R. W. Hoffman, Phys. Rev., vol. 78, p. 349, 1950.
4. L. Maissel and R. Glang, Handbook of thin film technology. New York: McGraw-Hill, 1970.
5. D. W. Hoffman and J. A. Thornton, “The compressive stress transition in Al, V, Zr, Nb and W metal films sputtered at low working pressures,” Thin Solid Films, vol. 45, pp. 387-396, 1977.
6. K. Kuroda and M. Yuda, “Niobium-stress influence on Nb/Al-oxide/Nb Josephson junctions,” J. Appl. Phys., vol. 63, no. 7, pp. 2352-2357, April 1988.
7. C. T. Wu, “Intrinsic stress of magnetron-sputtered niobium films,” Thin Solid Films, vol. 64, pp. 103-110, 1979.
8. T. Imamura and S. Hasuo, “Effects of intrinsic stress on submicrometer Nb/A1Ox/Nb Josephson junctions,” IEEE Trans. Magn. vol. 25, no. 2, x pp. 1119-1122, March 1989.
9. T. Imamura and S. Hasuo, “A submicrometer Nb/A1Ox/Nb Josephson junction,” J. Appl. Phys., vol. 64, pp. 1586-1588, 1988.
10. M. Bhushan and E. M. Macedo, “Nb/A1Ox/Nb trilayer process for the fabrication of submicron Josephson junctions and low-noise dc SQUIDs,” Appl. Phys. Lett., vol. 58, no. 12, pp. 1323-1325, March 1991.
11. T. Imamura, T. Shiota, and S. Hasuo, “Fabrication of high quality Nb/A1Ox-Al/Nb Josephson junctions; I-Sputtered Nb films for junction electrodes,” IEEE Trans. Appl. Supercon., vol. 2, no. 1, pp. 1-14, March 1992.
12. A. R. Kerr, S. K. Pan, A. W. Lichtenberger, and D. M. Lea, “Progress on tunerless SIS mixers for the 200-300 GHz Band,” IEEE Microwave and Guided Wave Lett., vol. 2, no. 11, pp. 454-456, Nov. 1992.
13. P. A. A. Booi, C. A. Livingston, and S. P. Benz, “Intrinsic stress in dc sputtered niobium,” IEEE Trans. Appl. Supercon., vol. 3, no. 2, pp. 3029-3031, June 1993.
14. C. K. Kwok, “Profiler applications note #1: stress measurement,” Tencor Instruments.
15. A. W. Lichtenberger, C. P. McClay, R. J. Mattauch, M. J. Feldman, S. -K. Pan, and A. R. Kerr, “Fabrication of Nb/Al-Al2O3/Nb junctions with extremely low leakage currents,” IEEE Trans. Magn., vol. 25, no. 2, pp. 1247-1250, March 1989.