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Volumn 85, Issue 7, 1999, Pages 3661-3665

Formation of modified Si/SiO2 interfaces with intrinsic low defect concentrations

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; ELECTRON SPIN RESONANCE SPECTROSCOPY; INTERFACES (MATERIALS); OXIDATION; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICA; THERMAL EFFECTS;

EID: 0032615232     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369730     Document Type: Article
Times cited : (20)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.