Implantation and dry etching of group-III-nitride semiconductors

MRS Bulletin

Volumn 22, Issue 2, 1997, Pages 36-43

  Zolper, J C ^a   Shul, R J ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ION IMPLANTATION; NITRIDES; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; PLASMA ETCHING; PLASMAS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS;

NITRIDE SEMICONDUCTORS; PLASMA INDUCED DAMAGE;

SEMICONDUCTOR MATERIALS;

EID: 0031073677     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/S0883769400032553     Document Type: Article

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