Ion implantation and rapid thermal processing of III-V nitrides

Journal of Electronic Materials

Volumn 25, Issue 5, 1996, Pages 839-844

  Zolper, J C ^a   Crawford, M Hagerott ^a   Pearton, S J ^b   Abernathy, C R ^b   Vartuli, C B ^b   Yuan, C ^c   Stall, R A ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b University of Florida   (United States)

^c EMCORE CORPORATION   (United States)

Author keywords

Gallium nitride; III V nitrides; Ion implantation; Rapid thermal anneal (RTA)

Indexed keywords

EID: 0001546366     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02666646     Document Type: Article

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