Strong interface effects in graded SiO2/Si/SiO2 quantum wells

Journal of Applied Physics

Volumn 84, Issue 9, 1998, Pages 5369-5371

  De Sousa, J S ^a   Farias, G A ^a   Freire, V N ^a   Da Silva Jr , K E F ^b  

^a FEDERAL UNIVERSITY OF CEARÁ   (Brazil)

^b FEDERAL UNIVERSITY OF PERNAMBUCO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001510956     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368818     Document Type: Article

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