Simulation of the early stages of thin SiO2 film growth

Semiconductor Science and Technology

Volumn 12, Issue 8, 1997, Pages 1038-1045

  Da Silva Jr , Eronides F ^a   Stošić, Borko D ^a,b  

^a FEDERAL UNIVERSITY OF PERNAMBUCO   (Brazil)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CURVE FITTING; DIFFUSION IN SOLIDS; FILM GROWTH; OXIDATION; PRESSURE EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR GROWTH; SILICA; THERMAL EFFECTS; THIN FILMS;

SCALING CONCEPT;

SEMICONDUCTING FILMS;

EID: 0031212217     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/12/8/018     Document Type: Article

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