An epitaxial Si/SiO2 superlattice barrier

Solid-State Electronics

Volumn 40, Issue 1-8, 1996, Pages 221-223

  Tsu, R ^a   Filios, A ^a   Lofgren, C ^a   Cahill, D ^b   Vannostrand, J ^b   Wang, C G ^c  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c Nanodynamics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MOLECULAR BEAMS; MONOLAYERS; MOS DEVICES; OXYGEN; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICA; THIN FILMS;

OXIDE GROWTH; QUANTUM DEVICES; SUPERLATTICE BARRIER;

SEMICONDUCTOR SUPERLATTICES;

EID: 0029725076     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(95)00253-7     Document Type: Article

References (18)

1. L. Esaki and R. Tsu, IBM J. Res. Dev. 14, 61 (1970).
2. R. Tsu and L. Esaki, Appl. Phys. Lett. 22, 562 (1973).
3. W. Wegscheider, K. Eberl, H. Cerva and H. Oppolzer, App. Phys. Lett. 55, 448 (1989).
4. K. Ismail, B. S. Meyerson and P. J. Wang, Appl. Phys. Lett. 59, 973 (1991).
5. R. Tsu, Nature 364, 19 (1993).
6. S. Sinharoy, J. Greggi and D. N. Schmidt, J. Appl. Phys. 64, 6296 (1988).
7. M. Ishida, S. Yameguchi, Y. Masa, T. Nakamura and Y. Hikita, J. Appl. Phys. 69, 8408 (1991).
8. Q. Y. Ye, R. Tsu and E. H. Nicollian, Phys. Rev. 44, 1806 (1991).
9. R. Tsu, X. L. Li and E. H. Nicollian, Appl. Phys. Lett. 65, 842 (1994).
10. D. Boeringer and R. Tsu, Phys. Rev. B 51, 13337 (1995).
11. A. Madan and M. P. Shaw, The Physics and Applications of Amorphous Semiconductors, Chap. 5. Academic Press, Boston (1988).
12. F. Smith and G. Ghidini, J. Electrochem. Soc. 129, 1300 (1982).
13. D. Meakin, M. Stobbs, J. Stoemenis and N. A. Economou, Appl. Phys. Lett. 52, 1053 (1988).
14. T. A. Rabedeau, I. M. Tidswell, P. S. Pershan, J. Berk and B. S. Freer, Appl. Phys. Lett. 59, 706 (1991).
15. Private communication from A. Ourmazd.
16. Private communications from M. Stobbs.
17. R. J. Hamers, U. K. Köhler and J. E. Demuth, Ultramicroscopy 31, 10 (1989).
18. See for example, MOS Physics and Technology (Edited by E. H. Nicollian and J. R. Brews). Wiley, New York (1982).