Growth and properties of CNx films prepared by reactive DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 8, 1998, Pages 4544-4549

  Jin, Yun Sik ^a   Matsuda, Yoshinobu ^a   Fujiyama, Hiroshi ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Carbon nitride; N C composition ratio; Nanocrystalline; OES; Reactive magnetron sputtering

Indexed keywords

CHEMICAL BONDS; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; TARGETS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS;

MAGNETRON SPUTTERING;

EID: 0032131329     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4544     Document Type: Article

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