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Volumn 72, Issue 4, 1998, Pages 456-458
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Hydrogen abstraction kinetics and crystallization in low temperature plasma deposition of silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001126367
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.120785 Document Type: Article |
Times cited : (40)
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References (17)
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