Deposition of a-Si:H and a-C:H using an expanding thermal arc plasma

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 268-274

  Van De Sanden, M C M ^a   Severens, R J ^a   Gielen, J W A M ^a   Paffen, R M J ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; PLASMA APPLICATIONS; PLASMA DENSITY; SEMICONDUCTING FILMS; THIN FILMS;

EXPANDING THERMAL ARC PLASMA DEPOSITION;

PLASMA SOURCES;

EID: 0030133959     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/022     Document Type: Article

References (40)

1. Luft W and Simon Tsuo Y 1993 Hydrogenated Amorphous Silicon Alloy Deposition Processes (New York: Marcel Dekker)
2. Clausing R E, Horton L L, Angus J C and Koidl P (eds) 1991 Diamond and Diamond-like Films and Coatings (New York: Plenum)
3. Ganguly G and Matsuda A 1993 Phys. Rev. B 47 3661
4. von Keudell A and Jacob W 1995 Appl. Phys. Lett. 66 1323
5. Li Y M, An I, Nguyen H V, Wronski C R and Collins R W 1992 Phys. Rev. Lett. 68 2815
6. Blayo N and Drevillon B 1990 Appl. Phys. Lett. 57 786
7. Toyoshima Y, Arai K, Matsuda A and Tanaka K 1990 Appl. Phys. Lett. 57 1028
8. Guizot J L, Nomoto K and Matsuda A 1991 Surf. Sci. 244 22
9. Matsuda A, Nomoto K, Takeuchi Y, Suzuki A, Yuuki A and Perrin J 1990 Surf. Sci. 227 50
10. Kushner M J 1988 J. Appl. Phys. 63 2532
11. Möller W 1993 Appl. Phys. A 56 527
12. Dekempeneer E H A, Smeets J, Meneve J, Eersels L and Jacobs R 1994 Thin Solid Films 241 269
13. Kea Nune P, Perrin J, Guillon J and Jolly J 1995 Plasma Sources Sci. Technol. 4 250
14. 1994 Plasma Sources Sci. Technol. 3 239-452
15. von Keudell A, Möller W and Hytry R 1993 Appl. Phys. Lett. 62 937
16. Perry A J, Vender D and Boswell R W 1991 J. Vac. Sci. Technol. B 9 310
17. Hopwood J, Guarnieri C R, Whitehair S J and Cuomo J J 1993 J. Vac. Sci. Technol. A 11 147
18. St-Onge L and Moisan M 1994 Plasma Chem. Plasma Process. 14 87
19. Aydil E, Gregus J A and Gottscho R A 1993 Rev. Sci. Instrum. 64 3572
20. Kortshagen U 1995 Plasma Sources Sci. Technol. 4 172
21. Takahasi K, Hori M and Goto T 1993 Japan. J. Appl. Phys 32 L1088
22. Buuron A J M, van de Sanden M C M, van Ooij W J, Driessens R M A and Schram DC 1995 J. Appl. Phys. 78 528
23. de Graaf M J, Severens R J, Dahiya R P, van de Sanden M C M and Schram D C 1993 Phys. Rev. 48 2098
24. Severens R J, Brussaard G J H, van de Sanden M C M and Schram D C 1995 Appl. Phys. Lett. 67 491
25. van de Sanden M C M, de Regt J M and Schram D C 1993 Phys. Rev. E. Sci. Instrum. 47 2792
26. Meulenbroeks R F G, van Beek A J, van Helvoort A J G, van de Sanden M C M and Schram DC 1994 Phys. Rev. E. Sci. Instrum. 49 4397
27. Maier W B 1965 J. Chem. Phys. 42 1790
28. Bowers M and Elleman D 1972 Chem. Phys. Lett. 16 486
29. Meeusen G J, Dahiya R P, van de Sanden M C M, Dinescu G, Zhou Qing, Meulenbroeks R F G and Schram D C 1994 Plasma Sources Sci. Technol. 3 521
30. Dischler B, Bubenzer A and Koidl P 1983 Solid State Commun. 48 105
31. Mul P M and McGowan J W 1980 Astrophys. J. 237 749
32. Millar T J 1988 Astron. Astrophys. 194 250
33. van der Zande M J 1995 Internal report, Eindhoven University of Technology
34. Robertson J 1993 Diamond Relat. Mater. 2 984
35. Lifshitz Y, Kasi S R and Rabalais J W 1989 Phys. Rev. Lett. 62 1290
36. von Keudell 1995 Personal communication
37. Gogolides E, Mary D, Rhallabi A and Turban G 1995 Japan. J. Appl. Phys. 34 261
38. Severens R J, Brussaard G J H, van de Sanden M C M and Schram DC 1995 Mat. Res. Soc. Symp. Proc. 377 32
39. van de Sanden M C M, Severens R J, Meulenbroeks R F G, de Graaf M J, Qing Z, Otorbaev D K, Engekn R, Gielen J W A M, van der Mullen J A M and Schram D C 1995 Surf. Coat. Technol. 74-75 1
40. van de Sanden M C M, Severens R J and Schram D C 1996 to be published