Lithographic lens testing: Analysis of measured aerial images, interferometric data and photoresist measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 788-798

  Flagello, Donis G ^a   Geh, Bernd ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; IMAGE PROCESSING; INTERFEROMETRY; PHOTORESISTS;

AERIAL IMAGES; LITHOGRAPHIC LENSES;

LENSES;

EID: 0030316303     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240940     Document Type: Conference Paper

References (9)

1. The influence of photoresist on the optical performance of high NA steppers
2. Theory of high-NA imaging in homogeneous thin films
3. Height and positions of maxima of partially coherent images of clear lines
4. Aerial image measurements on a commercial stepper
5. Quantitative stepper metrology using the focus monitor test mask
6. Latent image metrology for production wafer steppers