Techniques for measuring aberrations in lenses used in photolithography with printed patterns

Applied Optics

Volumn 38, Issue 13, 1999, Pages 2800-2807

  Nomura, Hiroshi ^a   Sato, Takashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; DIFFRACTION GRATINGS; FOURIER TRANSFORMS; IMAGE QUALITY; LIGHT INTERFERENCE; OPTICAL INSTRUMENT LENSES; POLYNOMIALS; SCANNING ELECTRON MICROSCOPY; SIGNAL DISTORTION; SUBSTRATES;

SEIDEL ABERRATIONS; ZERNIKE POLYNOMIALS;

PHOTOLITHOGRAPHY;

EID: 0032606814     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.38.002800     Document Type: Article

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