Overlay error of fine patterns by lens aberration using modified illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 686-696

  Saito, Takashi ^a   Watanabe, Hisashi ^a   Okuda, Yoshimitsu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ERROR ANALYSIS; EXCIMER LASERS; LENSES;

KRYPTON FLUORIDE; OPTICAL MICROLITHOGRAPHY; OVERLAY ERRORS;

PHOTOLITHOGRAPHY;

EID: 0031334497     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275988     Document Type: Conference Paper

References (8)