Experimental method for quantifying acid diffusion in chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 138-148

  Wallraff, G M ^a   Hinsberg, W D ^a   Houle, F A ^a   Morrison, M ^a   Larson, C E ^a   Sanchez, M ^a   Hoffnagle, J ^a   Brock, P J ^a   Breyta, G ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DIFFUSION IN SOLIDS; INFRARED SPECTROSCOPY; SEMICONDUCTOR DEVICE MODELS; THICKNESS MEASUREMENT;

CHEMICAL DEPROTECTION REACTION;

PHOTORESISTS;

EID: 0032687179     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350196     Document Type: Conference Paper

References (22)