Outlook for 157 nm resist design

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3267-3272

  Kunz, R R ^a   Bloomstein, T M ^a   Hardy, D E ^a   Goodman, R B ^a   Downs, D K ^a   Curtin, J E ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033269286     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590993     Document Type: Article

References (20)

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