Atomic force microscope based analysis of bound and bound+mobile phase monolayer behavior under mechanical and electrical stress

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 5, 2004, Pages 2337-2344

  Nainaparampil, J J ^a   Eapen, K C ^a   Zabinski, J S ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICRONANOTRIBOLOGY; MONOLAYER FILMS; TRIBOCHEMISTRY; TRIBOLOGICAL STRESSING;

ADHESION; ALCOHOLS; ATOMIC FORCE MICROSCOPY; CHEMICAL BEAM EPITAXY; CONDENSATION; DIFFUSION; ELECTRIC FIELDS; ESTERS; MICROELECTROMECHANICAL DEVICES; STRESS ANALYSIS; SURFACE TOPOGRAPHY; TRIBOLOGY; WEAR OF MATERIALS;

MONOLAYERS;

EID: 9744252313     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1787517     Document Type: Article

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