On a dual inductively coupled plasma for direct and remote plasma in a reactor

Physics of Plasmas

Volumn 11, Issue 10, 2004, Pages 4830-4836

  Uhm, Saehoon ^a   Lee, Kyong Ho ^a   Chang, Hong Young ^a   Chung, Chin Wook ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANTENNAS; CAPACITORS; ELECTRIC INDUCTORS; ELECTRON ENERGY LEVELS; MICROELECTROMECHANICAL DEVICES; PLASMA ACCELERATORS;

DUAL INDUCTIVELY COUPLED PLASMA; ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); POTENTIAL DIP; REMOTE PLASMA;

INDUCTIVELY COUPLED PLASMA;

EID: 8644221375     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1789997     Document Type: Article

References (30)

1. J. Hopwood, Plasma Sources Sci. Technol. 1, 109 (1998).
2. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, J. Appl. Phys. 85. 703 (1997).
3. V. A. Godyak and R. B. Piejak, J. Appl. Phys. 82, 5944 (1997).
4. R. J. Schutz, VLSI Technology (McGraw-Hill, New York).
5. P. Chabert, J. Vac. Sci. Technol. B 19, 1339 (2001).
6. J. W. Coburn and H. F. Winters, J. Vac. Sci. Technol. 16, 391 (1979).
7. J. Ding and N. Hershkowitz, Appl. Phys. Lett. 68, 1619 (1996).
8. Y. H. Lee and M. M. Chen, J. Appl. Phys. 54, 5966 (1983).
9. J. Ding, J. S. Jeng, G. H. Kim, H. L. Maynard, J. S. Hamers, and N. Hershkowitz, J. Vac. Sci. Technol. A 11, 1283 (1993).
10. N. Inagaki, S. Tasake, and S. Shimada, J. Appl. Polym. Sci. 79, 808 (2001).
11. Hauser, A. Weeber, A. W. Soppe, W. J. Path, and P. Bucher. Conference Record of the Twenty-Ninth IEEE, Photovoltaic Specialists Conference. 2002, p. 344.
12. H. Kim, J. Vac. Sci. Technol. B 21, 2231 (2003).
13. B. P. Luther, J. Ruzyllo, and D. L. Miller, Appl. Phys. Lett. 62, 1976 (1993).
14. D. H. Kim, Y. B. Park, I. J. Lee, and S. W. Rhee, J. Electrochem. Soc. 143, 2640 (1996).
15. C. W. Chung, S. S. Kim, and H. Y. Chang, Phys. Rev. E 69, 016406 (2004).
16. J. I. F. Palop, J. Ballesteros, V. Colomer, and M. A. Hernandez, Rev. Sci. Instrum. 66. 4625 (1995).
17. M. A. Liberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processings (Wiley, New York, 1994).
18. N. S. Yoon, B. C. Kim, J. G. Yang, and S. M. Hwang, IEEE Trans. Plasma Sci. 26, 190 (1998).
19. S. H. Seo, J. I. Hong, K. H. Bai, and H. Y. Chang, Phys. Plasmas 6, 614 (1999).
20. U. Kortshagen, N. D. Gibson, and J. E. Lawler, J. Phys. D 29, 1224 (1996).
21. I. M. El-Fayoumi, I. R. Jones, and M. M. Turner, J. Phys. D 31, 3082 (1998).
22. N. S. Yoon and S. M. Hwang, J. Korean Phys. Soc. 30, 657 (1997).
23. R. B. Piejak, V. A. Godyak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 1, 179 (1992).
24. S. H. Seo, J. I. Hong, and H. Y. Chang, Appl. Phys. Lett. 74, 2776 (1999).
25. J. I. Hong, S. H. Seo, S. S. Kim, N. S. Yoon, C. S. Chang, and H. Y. Chang, Phys. Plasmas 6, 1017 (1999).
26. K. Kato, S. Iizuka, and N. Sato, Appl. Phys. Lett. 6, 816 (1994).
27. V. I. Kolobov and W. N. G. Hitchon, Phys. Rev. E 52, 972 (1995).
28. U. Kortshagen, Phys. Rev. E 49, 4369 (1994).
29. L. D. Tsendin, Zh. Eksp. Teor. Fiz. 66, 7638 (1974) [Sov. Phys. JETP 39, 805 (1974)].
30. L. D. Tsendin, Zh. Eksp. Teor. Fiz. 66, 7638 (1974) [Sov. Phys. JETP 39, 805 (1974)].