Interface states at (formula presented) interfaces observed by x-ray photoelectron spectroscopy measurements under bias: Comparison between dry and wet oxidation

Physical Review B - Condensed Matter and Materials Physics

Volumn 67, Issue 11, 2003, Pages 8-

  Kobayashi, Hikaru ^a,b   Sakurai, Takeaki ^a,b   Takahashi, Masao ^a,b   Nishioka, Yasushiro ^c  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85038897600     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.67.115305     Document Type: Article

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