Theoretical and spectroscopic studies of gap-states at ultrathin silicon oxide/silicon interfaces

Journal of Chemical Physics

Volumn 111, Issue 17, 1999, Pages 8136-8143

  Kubota, Tomohiro ^a   Asano, Akira ^a   Nishioka, Yasushiro ^b   Kobayashi, Hikaru ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001283925     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.480148     Document Type: Article

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