Atmospheric Pressure Chemical Vapor Deposition Growth of Millimeter-Scale Single-Crystalline Graphene on the Copper Surface with a Native Oxide Layer

Chemistry of Materials

Volumn 28, Issue 14, 2016, Pages 4893-4900

  Wang, Shengnan ^a   Hibino, Hiroki ^a,b   Suzuki, Satoru ^a   Yamamoto, Hideki ^a  

^a NTT Basic Research Laboratories   (Japan)

^b KWANSEI GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CARBON; CRYSTALLINE MATERIALS; DECOMPOSITION; DEPOSITION; DESORPTION; GRAPHENE; GROWTH KINETICS; METAL CLADDING; NUCLEATION; SINGLE CRYSTALS; TEMPERATURE DISTRIBUTION; VAPOR DEPOSITION;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; AVERAGE GROWTH RATE; FIELD-EFFECT MOBILITIES; NUCLEATION AND GROWTH KINETICS; NUCLEATION DENSITIES; OPTIMIZED ANNEALING CONDITIONS; POSSIBLE MECHANISMS; TEMPERATURE DEPENDENCE;

CHEMICAL VAPOR DEPOSITION;

EID: 84979915848     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/acs.chemmater.6b00252     Document Type: Article

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