Copper oxide as a "self-cleaning" substrate for graphene growth

Journal of Materials Research

Volumn 29, Issue 3, 2014, Pages 403-409

  Magnuson, Carl W ^a   Kong, Xianghua ^a,b   Ji, Hengxing ^a,c   Tan, Cheng ^a   Li, Huifeng ^a   Piner, Richard ^a   Ventrice, Carl A ^d   Ruoff, Rodney S ^a  

^a The University of Texas at Austin   (United States)

^b HEFEI UNIVERSITY OF TECHNOLOGY   (China)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^d STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; CARBON DIOXIDE; CARBON MONOXIDE; CHEMICAL CLEANING; COPPER OXIDES; GRAPHENE; NUCLEATION; OXYGEN; SUBSTRATES;

ADVENTITIOUS CARBON; CHEMICAL VAPOUR DEPOSITION; COPPER FOILS; COPPER SUBSTRATES; COPPER SURFACE; GRAPHENE GROWTH; HIGHEST TEMPERATURE; HYDROGEN ANNEALING; RESIDUAL CARBON; SELF CLEANING;

CHEMICAL VAPOR DEPOSITION;

EID: 84894350607     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/jmr.2013.388     Document Type: Article

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