Hydrogen-excluded graphene synthesis via atmospheric pressure chemical vapor deposition

Carbon

Volumn 59, Issue , 2013, Pages 439-447

  Shin, Yong Cheol ^a   Kong, Jing ^b  

^a Massachusetts Institute of Technology   (United States)

^b Department of Electrical Engineering and Computer Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; BETTER PERFORMANCE; GROWTH MECHANISMS; GROWTH STEPS; KINETIC REGIME; LOW PRESSURE CVD; PROCESS STEPS; RATE-LIMITING STEPS;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; HYDROGEN; MONOLAYERS; VAPORS;

GRAPHENE;

EID: 84877691695     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2013.03.037     Document Type: Article

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