Atomic hydrogen catalysis for the formation of oxygen related nanoclusters in silicon: Application to low-temperature device production

IECON Proceedings (Industrial Electronics Conference)

Volumn 1, Issue , 2000, Pages 1889-1894

  Ulyashin, A G ^a   Job, R ^a   Fahmer, W R ^a  

^a UNIVERSITY OF HAGEN   (Germany)

Author keywords

Aggregates; Atomic measurements; Doping; Hydrogen; Job production systems; Nanoscale devices; Oxygen; Silicon; Temperature; Tiles

Indexed keywords

AGGREGATES; ATOMS; CATALYSIS; DOPING (ADDITIVES); HYDROGEN; HYDROGENATION; INDUSTRIAL ELECTRONICS; NANOCLUSTERS; NANOPARTICLES; OXYGEN; QUANTUM CHEMISTRY; SILICON; TEMPERATURE; TILE;

ATOMIC MEASUREMENTS; ELECTRICAL ACTIVATION; ELECTRONIC DEVICE STRUCTURES; HYDROGENATION TEMPERATURE; JOB PRODUCTION; LOW TEMPERATURE TECHNOLOGY; LOW-TEMPERATURE DEVICES; NANOSCALE DEVICE;

LOW TEMPERATURE PRODUCTION;

EID: 84969287156     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IECON.2000.972564     Document Type: Conference Paper

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