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Volumn 58, Issue 1, 1999, Pages 91-94
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Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CRYSTAL DEFECTS;
CRYSTAL GROWTH FROM MELT;
HYDROGEN;
ION IMPLANTATION;
HYDROGEN ENHANCED THERMAL DONOR FORMATION;
SPREADING RESISTANCE PROBE (SRP) ANALYSIS;
SILICON WAFERS;
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EID: 0345072497
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(98)00290-6 Document Type: Article |
Times cited : (10)
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References (12)
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