Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 2, 2016, Pages

  Hägglund, Carl ^a,b   Grehl, Thomas ^c   Tanskanen, Jukka T ^a   Yee, Ye Sheng ^a   Mullings, Marja N ^a   MacKus, Adriaan J M ^a   MacIsaac, Callisto ^a   Clemens, Bruce M ^a   Brongersma, Hidde H ^c   Bent, Stacey Francine ^a  

^a Stanford University   (United States)

^b UPPSALA UNIVERSITY   (Sweden)

^c ION TOF GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CRYSTALLINE MATERIALS; DEPOSITION; FILMS; LAMINATING; METALLIC COMPOUNDS; OXIDE SEMICONDUCTORS; SEMICONDUCTOR DOPING; TIN; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

BULK COMPOSITIONS; COMPLEX MATERIALS; LOW ENERGY ION SCATTERING; LOW TEMPERATURES; MULTI-LAYERED FILMS; SURFACE STOICHIOMETRY; SURFACE-SENSITIVE TECHNIQUE; THICKNESS DETERMINATION;

TIN OXIDES;

EID: 84959357363     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4941411     Document Type: Article

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