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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 3, 2011, Pages

Influence of organozinc ligand design on growth and material properties of ZnS and ZnO deposited by atomic layer deposition

(4) Tanskanen, Jukka T a,b Bakke, Jonathan R b Pakkanen, Tapani A a Bent, Stacey F b

a UNIVERSITY OF EASTERN FINLAND (Finland)

b Stanford University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; DEPOSITED FILMS; DIETHYLZINC; DIMETHYLZINC; LIGAND DESIGN; MATERIAL DEPOSITION; MATERIAL GROWTH; MATERIAL PROPERTY; METAL PRECURSOR; METAL SOURCES; S-PROCESS; STERIC FACTOR; XRD; ZN PRECURSORS; ZNO; ZNO FILMS; ZNS FILMS;

ATOMIC LAYER DEPOSITION; LIGANDS; MATERIALS PROPERTIES; ORGANOMETALLICS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

ZINC SULFIDE;

EID: 79955161600 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3572232 Document Type: Article

Times cited : (38)

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