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84983097377
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edited by D. P. DeWitt, J. Gelpey, B. Lojek, and Z. Nényei RTP Conference
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th International Conference on Advanced Thermal Processing of Semiconductors - RTP 2001, edited by D. P. DeWitt, J. Gelpey, B. Lojek, and Z. Nényei (RTP Conference, 2001), pp. 62-7.
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(2001)
th International Conference on Advanced Thermal Processing of Semiconductors - RTP 2001
, pp. 62-67
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Machala, C.F.1
Yang, S.-H.2
Bowen, C.3
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3
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0012006371
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edited by D.-L. Kwong, K. G. Reid, M. C. Öztürk, P. J. Timans and F. Roozeboom The Electrochemical Society, Pennington
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W. Lerch, B. Bayha, D. F. Downey and E. Arevalo, in Rapid Thermal and Other Short-Time Processing Technologies II, edited by D.-L. Kwong, K. G. Reid, M. C. Öztürk, P. J. Timans and F. Roozeboom (The Electrochemical Society, Pennington, 2001), pp. 321-36.
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Rapid Thermal and Other Short-Time Processing Technologies II
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Lerch, W.1
Bayha, B.2
Downey, D.F.3
Arevalo, E.4
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0001382554
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edited by Y. Nishi and R. Doering Marcel Dekker, Inc., New York
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P. J. Timans, R. Sharangpani and R. P. S. Thakur, in Handbook of Semiconductor Manufacturing Technology, edited by Y. Nishi and R. Doering (Marcel Dekker, Inc., New York, 2000), pp. 201-86).
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Handbook of Semiconductor Manufacturing Technology
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Timans, P.J.1
Sharangpani, R.2
Thakur, R.P.S.3
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7
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84901880487
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edited by H. Kitayama, B. Lojek, G. Miner and A. Tillmann RTP '99
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th International Conference on Advanced Thermal Processing of Semiconductors - RTP'99, edited by H. Kitayama, B. Lojek, G. Miner and A. Tillmann (RTP '99, 1999), pp. 26-38.
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(1999)
th International Conference on Advanced Thermal Processing of Semiconductors - RTP'99
, pp. 26-38
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Nguyen, L.H.1
Dietl, W.2
Niess, J.3
Nényei, Z.4
Tay, S.P.5
Obermeier, G.6
Downey, D.F.7
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8
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84983168189
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edited by D. P. DeWitt, J. Gelpey, B. Lojek, and Z. Nényei RTP Conference
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th International Conference on Advanced Thermal Processing of Semiconductors - RTP 2001, edited by D. P. DeWitt, J. Gelpey, B. Lojek, and Z. Nényei (RTP Conference, 2001), pp. 71-7.
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(2001)
th International Conference on Advanced Thermal Processing of Semiconductors - RTP 2001
, pp. 71-77
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Berger, R.1
Miethaner, S.2
Gruber, H.3
Niess, J.4
Dietl, W.5
Nényei, Z.6
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84962427821
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edited by J. Gelpey, B. Lojek, Z. Nényei and R. Singh IEEE
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th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP2002, edited by J. Gelpey, B. Lojek, Z. Nényei and R. Singh (IEEE, 2002), pp. 49-57.
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th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP2002
, pp. 49-57
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Niess, J.1
Berger, R.2
Timans, P.J.3
Nényei, Z.4
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45749116921
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edited by P. J. Timans, E. Gusev, F. Roozeboom, M. C. Öztürk and D.-L. Kwong The Electrochemical Society, Pennington
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Z. Nényei, J. Niess, S. Buschbaum, K. Meyer, W. Dietl, R. Berger, S. Miethaner, H. Gruber, R. Wahlich and S. Chamberlain, in Rapid Thermal and Other Short-Time Processing Technologies III, edited by P. J. Timans, E. Gusev, F. Roozeboom, M. C. Öztürk and D.-L. Kwong (The Electrochemical Society, Pennington, 2002), pp. 261-72.
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Rapid Thermal and Other Short-Time Processing Technologies III
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Nényei, Z.1
Niess, J.2
Buschbaum, S.3
Meyer, K.4
Dietl, W.5
Berger, R.6
Miethaner, S.7
Gruber, H.8
Wahlich, R.9
Chamberlain, S.10
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13
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0242693420
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edited by R. B. Fair and B. Lojek RTP'95
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rd International Rapid Thermal Processing Conference - RTP'95, edited by R. B. Fair and B. Lojek (RTP'95, 1995), pp. 181-97.
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(1995)
rd International Rapid Thermal Processing Conference - RTP'95
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Erofeev, A.F.1
Kolpakov, A.V.2
Makhviladze, T.M.3
Martjushenko, A.V.4
Panjukhin, A.V.5
Volchek, O.S.6
Orlowski, M.7
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14
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28444451459
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edited by R. B. Fair, M. L. Green, B. Lojek and R. P. S. Thakur RTP'96
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th International Conference on Advanced Thermal Processing of Semiconductors - RTP'96, edited by R. B. Fair, M. L. Green, B. Lojek and R. P. S. Thakur (RTP'96, 1996), pp. 417-9.
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th International Conference on Advanced Thermal Processing of Semiconductors - RTP'96
, pp. 417-419
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Kuehne, J.1
Hattangady, S.2
Pas, M.3
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edited by J. Gelpey, B. Lojek, Z, Nényei and R. Singh IEEE
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th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP2002, edited by J. Gelpey, B. Lojek, Z, Nényei and R. Singh (IEEE, 2002), pp. 69-73.
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th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP2002
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Poarch, S.2
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Surdeanu, R.7
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McCoy, S.11
Gelpey, J.12
Elliott, K.13
Pages, X.14
Satta, A.15
Lauwers, A.16
Stolk, P.17
Maex, K.18
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edited by P. J. Timans, E. Gusev, F. Roozeboom, M. C. Öztürk and D.-L. Kwong The Electrochemical Society, Pennington
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J. C. Gelpey, K. Elliott, D. Camm, S. McCoy, J. Ross, D. F. Downey and E. A. Arevalo, in Rapid Thermal and Other Short-Time Processing Technologies III, edited by P. J. Timans, E. Gusev, F. Roozeboom, M. C. Öztürk and D.-L. Kwong (The Electrochemical Society, Pennington, 2002), pp. 313-24.
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, pp. 313-324
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Elliott, K.2
Camm, D.3
McCoy, S.4
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Downey, D.F.6
Arevalo, E.A.7
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T. Ito, K. Suguro, M. Tamura, T. Taniguchi, Y. Ushiku, T. Iinuma, T. Itani, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama and T. Kusada, IEEE Trans. Semiconductor Manufacturing 16, 417 (2003).
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W. Lerch, S. Paul, D. F. Downey and E. A. Arevalo, in Advanced Short-Time Thermal Processing for Si-Based CMOS Devices, edited by F. Roozeboom, E. P. Gusev, L. J. Chen, M. C. Öztürk, D.-L. Kwong and P. J. Timans (The Electrochemical Society, Pennington, 2003), pp. 43-50.
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S. Paul, B. Bayha, W. Lerch, C. Merkl, D. F. Downey and E. A. Arevalo, "Production Worthy Repeatability of Spike Anneals", in International Ion Implantation Technology conference 2002, Taos, NM, to be published (IEEE).
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International Ion Implantation Technology Conference 2002, Taos, NM
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Characterization of RTP Annealed USJ on 200 and 300 mm Wafers
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S. Paul, W. Lerch, D. F. Downey and E. A. Arevalo, "Characterization of RTP Annealed USJ on 200 and 300 mm Wafers", in 7th International Workshop on the Fabrication Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, April 27th - May 1st 2003 Santa Cruz, CA, to be published (AVS).
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