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Volumn , Issue , 2003, Pages 17-33

Challenges for ultra-shallow junction formation technologies beyond the 90 nm node

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HEAT TREATMENT; ION IMPLANTATION; MOS DEVICES; NANOTECHNOLOGY; RAPID THERMAL ANNEALING; SILICON WAFERS;

EID: 84954101115     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2003.1249120     Document Type: Conference Paper
Times cited : (19)

References (40)
  • 3
    • 0012006371 scopus 로고    scopus 로고
    • edited by D.-L. Kwong, K. G. Reid, M. C. Öztürk, P. J. Timans and F. Roozeboom The Electrochemical Society, Pennington
    • W. Lerch, B. Bayha, D. F. Downey and E. Arevalo, in Rapid Thermal and Other Short-Time Processing Technologies II, edited by D.-L. Kwong, K. G. Reid, M. C. Öztürk, P. J. Timans and F. Roozeboom (The Electrochemical Society, Pennington, 2001), pp. 321-36.
    • (2001) Rapid Thermal and Other Short-Time Processing Technologies II , pp. 321-336
    • Lerch, W.1    Bayha, B.2    Downey, D.F.3    Arevalo, E.4
  • 21
    • 5544258826 scopus 로고    scopus 로고
    • edited by F. Roozeboom, E. P. Gusev, L. J. Chen, M. C. Öztürk, D.-L. Kwong and P. J. Timans The Electrochemical Society, Pennington
    • W. Lerch, S. Paul, D. F. Downey and E. A. Arevalo, in Advanced Short-Time Thermal Processing for Si-Based CMOS Devices, edited by F. Roozeboom, E. P. Gusev, L. J. Chen, M. C. Öztürk, D.-L. Kwong and P. J. Timans (The Electrochemical Society, Pennington, 2003), pp. 43-50.
    • (2003) Advanced Short-Time Thermal Processing for Si-Based CMOS Devices , pp. 43-50
    • Lerch, W.1    Paul, S.2    Downey, D.F.3    Arevalo, E.A.4
  • 25
    • 28444438804 scopus 로고    scopus 로고
    • edited by F. Roozeboom, E. P. Gusev, L. J. Chen, M. C. Öztürk, D.-L. Kwong and P. J. Timans The Electrochemical Society, Pennington
    • J. Niess, Z. Nényei, W. Lerch and S. Paul, in Advanced Short-Time Thermal Processing for Si-Based CMOS Devices, edited by F. Roozeboom, E. P. Gusev, L. J. Chen, M. C. Öztürk, D.-L. Kwong and P. J. Timans (The Electrochemical Society, Pennington, 2003), pp. 11-16.
    • (2003) Advanced Short-Time Thermal Processing for Si-Based CMOS Devices , pp. 11-16
    • Niess, J.1    Nényei, Z.2    Lerch, W.3    Paul, S.4
  • 32
    • 33744817026 scopus 로고    scopus 로고
    • edited by F. Roozeboom, J. C. Gelpey, M. C. Öztürk, K. Reid and D.-L. Kwong The Electrochemical Society, Pennington
    • S. Talwar, Y. Wang and C. Gelatos, in Rapid Thermal and Other Short-Time Processing Technologies II, edited by F. Roozeboom, J. C. Gelpey, M. C. Öztürk, K. Reid and D.-L. Kwong (The Electrochemical Society, Pennington, 2000), pp. 95-106.
    • (2000) Rapid Thermal and Other Short-Time Processing Technologies II , pp. 95-106
    • Talwar, S.1    Wang, Y.2    Gelatos, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.