Electrical activation kinetics for shallow boron implants in silicon

Applied Physics Letters

Volumn 74, Issue 18, 1999, Pages 2658-2660

  Fiory, A T ^a   Bourdelle, K K ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000156339     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123929     Document Type: Article

References (10)

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