메뉴 건너뛰기




Volumn 6, Issue 9, 2015, Pages 1236-1248

Research on the piezoelectric properties of AlN thin films for MEMS applications

Author keywords

Aluminum nitride; Finite element method; MEMS; Piezoelectric coefficient; Piezoresponse force microscopy

Indexed keywords

ALUMINUM NITRIDE; ELECTRIC FIELDS; ELECTRODES; MEMS; PIEZOELECTRICITY; SCANNING PROBE MICROSCOPY; THIN FILMS;

EID: 84949564468     PISSN: None     EISSN: 2072666X     Source Type: Journal    
DOI: 10.3390/mi6091236     Document Type: Article
Times cited : (36)

References (16)
  • 1
    • 36149007835 scopus 로고
    • Elastic and piezoelectric coefficients of single-crystal bariμm titanate
    • Berlincourt, D.; Jaffe, H. Elastic and piezoelectric coefficients of single-crystal bariμm titanate. Phys. Rev. 1958, 143.
    • (1958) Phys. Rev. , pp. 143
    • Berlincourt, D.1    Jaffe, H.2
  • 3
    • 62449233216 scopus 로고    scopus 로고
    • Piezoelectric Coefficients of Thin Film Aluminum Nitride Characterizations Using Capacitance Measurements
    • Al Ahmad, M.; Plana, R. Piezoelectric Coefficients of Thin Film Aluminum Nitride Characterizations Using Capacitance Measurements. IEEE Microw. Wirel. Compon. Lett. 2009, 19, 140-142.
    • (2009) IEEE Microw. Wirel. Compon. Lett. , vol.19 , pp. 140-142
    • Al Ahmad, M.1    Plana, R.2
  • 4
    • 77955415592 scopus 로고    scopus 로고
    • The influence of sputter deposition parameters on piezoelectric and mechanical properties of AlN thin films
    • Ababneh, A.; Schmid, U.; Hernando, J.; Sánchez-Rojas, J.L.; Seidel, H. The influence of sputter deposition parameters on piezoelectric and mechanical properties of AlN thin films. Mater. Sci. Eng. B 2010, 172, 253-258.
    • (2010) Mater. Sci. Eng. B , vol.172 , pp. 253-258
    • Ababneh, A.1    Schmid, U.2    Hernando, J.3    Sánchez-Rojas, J.L.4    Seidel, H.5
  • 5
    • 0035356644 scopus 로고    scopus 로고
    • Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering
    • Dubois, M.A.; Muralt, P. Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering. J. Appl. Phys. 2001, 89, 6389-6395.
    • (2001) J. Appl. Phys. , vol.89 , pp. 6389-6395
    • Dubois, M.A.1    Muralt, P.2
  • 7
    • 1842427341 scopus 로고    scopus 로고
    • Thickness dependence of the properties of highly c-axis textured AlN thin films
    • Martin, F.; Muralt, P.; Dubois, M.A.; Pezous, A. Thickness dependence of the properties of highly c-axis textured AlN thin films. J. Vac. Sci. Technol. A 2004, 22, 361-365.
    • (2004) J. Vac. Sci. Technol. A , vol.22 , pp. 361-365
    • Martin, F.1    Muralt, P.2    Dubois, M.A.3    Pezous, A.4
  • 8
    • 33745500126 scopus 로고    scopus 로고
    • Piezoelectric properties of thin AlN layers for MEMS application determined by piezoresponse force microscopy
    • Tonisch, K.; Cimalla, V.; Foerster, C.; Dontsov, D.; Ambacher, O. Piezoelectric properties of thin AlN layers for MEMS application determined by piezoresponse force microscopy. Phys. Status Solidi C 2006, 3, 2274-2277.
    • (2006) Phys. Status Solidi C , vol.3 , pp. 2274-2277
    • Tonisch, K.1    Cimalla, V.2    Foerster, C.3    Dontsov, D.4    Ambacher, O.5
  • 9
    • 84901933191 scopus 로고    scopus 로고
    • A model for longitudinal piezoelectric coefficient measurement of the aluminum nitride thin films
    • Bi, X.; Wu, Y.; Wu, J.; Li, H.; Zhou, L. A model for longitudinal piezoelectric coefficient measurement of the aluminum nitride thin films. J. Mater. Sci. Mater. Electron. 2014, 25, 2435-2442.
    • (2014) J. Mater. Sci. Mater. Electron. , vol.25 , pp. 2435-2442
    • Bi, X.1    Wu, Y.2    Wu, J.3    Li, H.4    Zhou, L.5
  • 10
    • 77954858167 scopus 로고    scopus 로고
    • Piezoelectric Coefficient Measurement of AIN Thin Films at the Nanometer Scale by Using Piezoresponse Force Microscopy
    • Hyunchang, S.; Joon-Tae, S. Piezoelectric Coefficient Measurement of AIN Thin Films at the Nanometer Scale by Using Piezoresponse Force Microscopy. J. Korean Phys. Soc. 2010, 56, 580-585.
    • (2010) J. Korean Phys. Soc. , vol.56 , pp. 580-585
    • Hyunchang, S.1    Joon-Tae, S.2
  • 11
    • 20844450997 scopus 로고    scopus 로고
    • Study of orientation effect on nanoscale polarization in BaTiO3 thin films using piezoresponse force microscopy
    • Kim, I.D.; Avrahami, Y.; Tuller, H.L.; Park, Y.B.; Dicken, M.J.; Atwater, H.A. Study of orientation effect on nanoscale polarization in BaTiO3 thin films using piezoresponse force microscopy. Appl. Phys. Lett. 2005, 86, 192907.
    • (2005) Appl. Phys. Lett. , vol.86
    • Kim, I.D.1    Avrahami, Y.2    Tuller, H.L.3    Park, Y.B.4    Dicken, M.J.5    Atwater, H.A.6
  • 12
    • 2442509867 scopus 로고    scopus 로고
    • Physical properties of polycrystalline aluminium nitride films deposited by magnetron sputtering
    • Mortet, V.; Nesladek, M.; Haenen, K.; Morel, A.; D'Olieslaeger, M.; Vanecek, M. Physical properties of polycrystalline aluminium nitride films deposited by magnetron sputtering. Diam. Relat. Mater. 2004, 13, 1120-1124.
    • (2004) Diam. Relat. Mater. , vol.13 , pp. 1120-1124
    • Mortet, V.1    Nesladek, M.2    Haenen, K.3    Morel, A.4    D'Olieslaeger, M.5    Vanecek, M.6
  • 13
    • 77950953019 scopus 로고    scopus 로고
    • Influence of substrate metals on the crystal growth of AlN films
    • Xiong, J.; Gu, H.S.; Hu, K.; Hu, M.Z. Influence of substrate metals on the crystal growth of AlN films. Int. J. Miner. Metall. Mater. 2010, 17, 98-103.
    • (2010) Int. J. Miner. Metall. Mater. , vol.17 , pp. 98-103
    • Xiong, J.1    Gu, H.S.2    Hu, K.3    Hu, M.Z.4
  • 15
    • 33144479517 scopus 로고    scopus 로고
    • Influence of test capacitor features on piezoelectric and dielectric measurement of ferroelectric films
    • Wang, Z.; Lau, G.K.; Zhu, W.; Chao, C. Influence of test capacitor features on piezoelectric and dielectric measurement of ferroelectric films. IEEE Trans. Ultrason. Ferroelectr. Freq. Control 2006, 53, 15-22.
    • (2006) IEEE Trans. Ultrason. Ferroelectr. Freq. Control , vol.53 , pp. 15-22
    • Wang, Z.1    Lau, G.K.2    Zhu, W.3    Chao, C.4
  • 16
    • 5244280905 scopus 로고    scopus 로고
    • Interferometric measurements of electric field-induced displacements in piezoelectric thin films
    • Kholkin, A.L.; Wütchrich, C.; Taylor, D.V.; Setter, N. Interferometric measurements of electric field-induced displacements in piezoelectric thin films. Rev. Sci. Instrum. 1996, 67, 1935-1941.
    • (1996) Rev. Sci. Instrum. , vol.67 , pp. 1935-1941
    • Kholkin, A.L.1    Wütchrich, C.2    Taylor, D.V.3    Setter, N.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.