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Volumn 51, Issue 92, 2015, Pages 16553-16556

Atomic layer deposition on 2D transition metal chalcogenides: Layer dependent reactivity and seeding with organic ad-layers

(8) Wirtz, Christian a Hallam, Toby a Cullen, Conor Patrick a Berner, Nina C a O'Brien, Maria a Marcia, Mario b Hirsch, Andreas b Duesberg, Georg S a

a TRINITY COLLEGE DUBLIN (Ireland)

b UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDE; CHALCOGEN; MOLYBDENUM; MOLYBDENUM DISULFIDE; PERYLENE; TUNGSTEN DERIVATIVE; TUNGSTEN DISULFIDE; UNCLASSIFIED DRUG; ORGANIC COMPOUND; TRANSITION ELEMENT;

ADSORPTION KINETICS; ARTICLE; ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; CHEMICAL REACTION; CONFORMATIONAL TRANSITION; CRYSTAL STRUCTURE; INTEGRATED CIRCUIT; LOW TEMPERATURE; PARTICLE SIZE; RAMAN SPECTROMETRY; VAPOR; CHEMISTRY; SURFACE PROPERTY;

ALUMINUM OXIDE; CHALCOGENS; ORGANIC CHEMICALS; SURFACE PROPERTIES; TRANSITION ELEMENTS;

EID: 84946761289 PISSN: 13597345 EISSN: 1364548X Source Type: Journal
DOI: 10.1039/c5cc05726d Document Type: Article

Times cited : (43)

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