High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz

Solar Energy Materials and Solar Cells

Volumn 143, Issue , 2015, Pages 347-353

  Strobel, C ^a   Leszczynska, B ^a   Merkel, U ^a   Kuske, J ^b   Fischer, D D ^a   Albert, M ^a   Holovsky J ^c   Michard, S ^d   Bartha, J W ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b FAP Forschungs und Applikationslabor Plasmatechnik GmbH Dresden   (Germany)

^c INSTITUTE OF PHYSICS   (Czech Republic)

^d FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

High efficiency; High rate; Microcrystalline silicon; PECVD; Solar cell; VHF

Indexed keywords

DEPOSITION; DEPOSITION RATES; EFFICIENCY; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SILICON; SOLAR CELLS; THIN FILMS;

HIGH RATE; HIGH-EFFICIENCY; LINEAR PLASMA SOURCES; MICROCRYSTALLINE SILICON THIN FILMS; PLASMA EXCITATION FREQUENCIES; SOLAR CELL FABRICATION; THIN-FILM SILICON SOLAR CELLS; VHF;

SILICON SOLAR CELLS;

EID: 84938230094     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2015.07.014     Document Type: Article

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