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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 6, 2015, Pages

Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

(2) Muneshwar, Triratna a Cadien, Ken a

a UNIVERSITY OF ALBERTA (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; SURFACE REACTIONS;

ALD GROWTH; GROWTH PER CYCLE; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; PROCESS PARAMETERS; SELF-DECOMPOSITION; SIDE REACTIONS;

ATOMIC LAYER DEPOSITION;

EID: 84936881124 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.4926382 Document Type: Article

Times cited : (10)

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