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Volumn 154, Issue 11, 2007, Pages

Characteristics of Alx Ti1-x Oy films grown by plasma-enhanced atomic layer deposition

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC LAYER DEPOSITION; FILM GROWTH; GROWTH RATE; PERMITTIVITY; REFRACTIVE INDEX;

PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SURFACE MATERIAL;

METALLIC FILMS;

EID: 34848928784 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2776162 Document Type: Article

Times cited : (24)

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