Barrier characteristics of ZrN films deposited by remote plasma-enhanced atomic layer deposition using tetrakis(diethylamino)zirconium precursor

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 7 A, 2007, Pages 4085-4088

  Cho, Seungchan ^a   Lee, Keunwoo ^b   Song, Pungkeun ^a   Jeon, Hyeongtag ^b   Kim, Yangdo ^a  

^a Pusan National University   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Diffusion barrier; Remote PEALD; Zirconium nitride (ZrN)

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; DIFFUSION BARRIERS; OPTIMIZATION; PARAMETER ESTIMATION; THIN FILMS;

REMOTE PEALD; ZIRCONIUM NITRIDE (ZRN);

ZIRCONIUM COMPOUNDS;

EID: 34547850356     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.4085     Document Type: Article

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