TiO 2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation

Applied Surface Science

Volumn 345, Issue , 2015, Pages 49-56

  Wang, Hui ^a,b   Li, Yujie ^a   Ba, Xin ^a   Huang, Lin ^a   Yu, Ying ^a  

^a CENTRAL CHINA NORMAL UNIVERSITY   (China)

^b WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Anatase; Band gap; DC magnetron sputtering; Rutile; TiO 2 thin film

Indexed keywords

ARGON; COPPER; DENSITY FUNCTIONAL THEORY; ELECTRONIC STRUCTURE; ENERGY GAP; FILM PREPARATION; HEAVY IONS; OPTICAL PROPERTIES; OXIDE MINERALS; PHASE STRUCTURE; SCANNING ELECTRON MICROSCOPY; SPECTROMETERS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

ANATASE STRUCTURES; DC MAGNETRON CO-SPUTTERING; DC MAGNETRON SPUTTERING; ELECTRONIC STRUCTURE CALCULATIONS; RUTILE; TIO2 THIN FILMS; UV-VIS SPECTROPHOTOMETERS; X RAY PHOTOELECTRON SPECTROMETERS;

TITANIUM DIOXIDE;

EID: 84933500001     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.03.106     Document Type: Article

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