SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 520, Issue 6, 2012, Pages 1809-1813

Low temperature stabilized rutile phase TiO 2 films grown by sputtering

(7) Pradhan, Swati S a Pradhan, S K a Bhavanasi, V a Sahoo, Sambita a Sarangi, S N b Anwar, S a Barhai, P K c

a CSIR INSTITUTE OF MINERALS AND MATERIALS TECHNOLOGY (India)

b INSTITUTE OF PHYSICS (India)

c BIRLA INSTITUTE OF TECHNOLOGY (India)

Author keywords

O 2 Ar flow ratio; Reactive RF magnetron sputtering; Rutile; Titanium dioxide

Indexed keywords

CRYSTALLINE PHASE; CRYSTALLINITIES; DIFFERENT SUBSTRATES; FILM DEPOSITION RATES; FLOW RATIOS; GROWTH CONDITIONS; HIGH REFRACTIVE INDEX; HIGH TRANSMITTANCE; LOW TEMPERATURES; OPTICAL CHARACTERISTICS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; RUTILE; RUTILE FILMS; RUTILE PHASE; TIO; TOTAL PRESSURE; UNHEATED SUBSTRATES;

ENERGY GAP; FILM GROWTH; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OXIDE MINERALS; REFRACTIVE INDEX; TITANIUM; TITANIUM DIOXIDE;

OPTICAL FILMS;

EID: 84855971169 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.106 Document Type: Article

Times cited : (35)

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