Natural superhydrophilic TiO2/SiO2 composite thin films deposited by radio frequency magnetron sputtering

Journal of Alloys and Compounds

Volumn 479, Issue 1-2, 2009, Pages 532-535

  Liu, Y Y ^a   Qian, L Q ^a   Guo, C ^a   Jia, X ^a   Wang, J W ^a   Tang, W H ^a  

^a Zhejiang University Zijingang Campus   (China)

Author keywords

RF magnetron sputtering; Superhydrophilicity; TiO2 SiO2 composite films

Indexed keywords

AMORPHOUS STRUCTURES; COMPOSITE TARGETS; COMPOSITE THIN FILMS; HYDROPHILIC FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING; SUPER-HYDROPHILIC; SUPERHYDROPHILICITY; TIO2/SIO2 COMPOSITE FILMS; UV IRRADIATIONS; VARIOUS SUBSTRATES; WATER CONTACTS; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XRD ANALYSIS;

ATOMIC SPECTROSCOPY; CONTACT ANGLE; MAGNETRON SPUTTERING; MAGNETRONS; RADIO; RADIO WAVES; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITE FILMS;

EID: 67349083904     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.12.125     Document Type: Article

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