Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering

Journal of Environmental Sciences

Volumn 21, Issue 6, 2009, Pages 741-744

  ZHANG, Can ^a   DING, Wanyu ^a   WANG, Hualin ^a   CHAI, Weiping ^a   JU, Dongying ^b  

^a DALIAN JIAOTONG UNIVERSITY   (China)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

anatase; DC pulse magnetron sputtering; TiO2 film; UV induced photocatalysis

Indexed keywords

ANATASE; ANATASE TIO; CRYSTALLINE STRUCTURE; DC PULSE MAGNETRON SPUTTERING; DEGRADATION RATE; DEPOSITION PARAMETERS; LOW TEMPERATURES; METHYL ORANGE SOLUTION; MORPHOLOGICAL FEATURES; PHOTOCATALYTIC ACTIVITIES; PULSE MAGNETRON SPUTTERING; ROOM TEMPERATURE; SELF-BIAS; TIO; TIO2 FILM; ULTRA-VIOLET LIGHT; UV INDUCED PHOTOCATALYSIS; WORKING PRESSURES;

ATOMIC FORCE MICROSCOPY; AZO DYES; DEGRADATION; MAGNETRON SPUTTERING; MAGNETRONS; PHOTODEGRADATION; TITANIUM DIOXIDE; TITANIUM OXIDES; ULTRAVIOLET RADIATION; X RAY DIFFRACTION;

PHOTOCATALYSIS;

AZO COMPOUND; DYES, REAGENTS, INDICATORS, MARKERS AND BUFFERS; METHYL ORANGE; TITANIUM; TITANIUM DIOXIDE;

ANATASE; ATOMIC FORCE MICROSCOPY; DEGRADATION; IRRADIATION; TITANIUM; X-RAY DIFFRACTION;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTROCHEMICAL ANALYSIS; EVALUATION; PRESSURE; TEMPERATURE; X RAY DIFFRACTION;

AZO COMPOUNDS; ELECTROCHEMICAL TECHNIQUES; INDICATORS AND REAGENTS; MICROSCOPY, ATOMIC FORCE; PRESSURE; TEMPERATURE; TITANIUM; X-RAY DIFFRACTION;

EID: 67149099664     PISSN: 10010742     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1001-0742(08)62334-7     Document Type: Article

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