Cr-doped TiO2 thin films deposited by RF-sputtering

Materials Letters

Volumn 64, Issue 21, 2010, Pages 2287-2289

  Jun, Tae Ho ^a   Lee, Kee Sun ^a  

^a Kongju National University   (South Korea)

Author keywords

Cr doped TiO2; Hydrophilicity; Photochemical technology; Thin films

Indexed keywords

BAND GAPS; CR-DOPED; CR-DOPING; MIXED PHASE; PHOTOCHEMICAL TECHNOLOGY; RF-SPUTTERING; TIO;

DOPING (ADDITIVES); ENERGY GAP; HYDROPHILICITY; OXIDE MINERALS; THIN FILMS; TITANIUM DIOXIDE; VAPOR DEPOSITION;

CHROMIUM;

EID: 77955544030     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.07.069     Document Type: Article

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