Flexible deposition of TiO2 electrodes for photocatalytic applications: Modulation of the crystal phase as a function of the layer thickness

Journal of Solid State Chemistry

Volumn 199, Issue , 2013, Pages 1-6

  Tealdi, C ^a   Quartarone, E ^a   Galinetto, P ^a   Grandi, M S ^a,b   Mustarelli, P ^a  

^a UNIVERSITY OF PAVIA   (Italy)

^b Arkedos Srl ^*  (Italy)

Author keywords

Photocatalysis; Raman spectroscopy; RF sputtering; Thin films; TiO2

Indexed keywords

ACTIVE LAYER; CRYSTAL PHASE; CRYSTALLINE PHASE; DEPOSITION TEMPERATURES; ELECTROCHEMICAL APPLICATIONS; LAYER THICKNESS; PHOTO-CATALYTIC; PHOTOCATALYTIC APPLICATION; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-SPUTTERING; TIO; VARIABLE TEMPERATURE;

ELECTRODES; OXIDE MINERALS; PHOTOCATALYSIS; RAMAN SPECTROSCOPY; THIN FILMS; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84873698033     PISSN: 00224596     EISSN: 1095726X     Source Type: Journal    
DOI: 10.1016/j.jssc.2012.11.019     Document Type: Article

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