Electrochemically deposited gallium oxide nanostructures on silicon substrates

Nanoscale Research Letters

Volumn 9, Issue 1, 2014, Pages

  Ghazali, Norizzawati Mohd ^a   Mahmood, Mohamad Rusop ^b   Yasui, Kanji ^c   Hashim, Abdul Manaf ^a,d  

^a MALAYSIA JAPAN INTERNATIONAL INSTITUTE OF TECHNOLOGY   (Malaysia)

^b UNIVERSITI TEKNOLOGI MARA   (Malaysia)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^d TECHNOLOGY PARK MALAYSIA   (Malaysia)

Author keywords

Electrochemical deposition; Gallium nitride; Gallium oxide; Liquid phase; Nanorod

Indexed keywords

AMMONIUM HYDROXIDE; ELECTROCHEMICAL DEPOSITION; ELECTROLYTES; GALLIUM NITRIDE; III-V SEMICONDUCTORS; MOLAR CONCENTRATION; NANODOTS; NANORODS; NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; REDUCTION; SUBSTRATES;

APPLIED POTENTIALS; GALLIUM OXIDES; GROWN STRUCTURES; HYDROTHERMAL PROCESS; LIQUID PHASE; NANODOT STRUCTURES; SILICON SUBSTRATES; THERMAL TRANSFORMATIONS;

SILICON;

EID: 84928380046     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-9-120     Document Type: Article

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